XPS study of sputtered alumina thin films

Ceramics International

Volumn 40, Issue 7 PART B, 2014, Pages 11099-11107

  Reddy, Neelakanta ^a   Bera, Parthasarathi ^b   Reddy, V Rajagopal ^c   Sridhara, N ^a   Dey, Arjun ^a   Anandan, C ^b   Sharma, Anand Kumar ^a  

^a INDIAN SPACE RESEARCH ORGANISATION   (India)

^b SURFACE ENGINEERING DIVISION   (India)

^c SRI VENKATESWARA UNIVERSITY   (India)

Author keywords

Alumina; Microstructure; Sputtering; Thin film; X ray photoelectron spectroscopy

Indexed keywords

ALUMINA; BINDING ENERGY; DEPOSITION; ELECTRONIC STRUCTURE; MAGNETRON SPUTTERING; MICROSTRUCTURE; OPTICAL FILMS; PHOTOELECTRONS; REACTIVE SPUTTERING; SPUTTERING; THIN FILMS;

ALUMINA THIN FILMS; ATOMIC CONCENTRATION; CHEMICAL COMPOSITIONS; DEPOSITION METHODS; FILM-DEPOSITION PROCESS; REACTIVE SPUTTERING METHOD; RF MAGNETRON SPUTTERING TECHNIQUE; SENSITIVE FUNCTIONS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84900472204     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2014.03.133     Document Type: Article

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