Development of SiO2 based thin film on metal foils for space application

Ceramics International

Volumn 39, Issue 7, 2013, Pages 8493-8498

  Reddy, I Neelakanta ^a,b   Reddy, V Rajagopal ^b   Sridhara, N ^a   Basavaraja, S ^c   Venkatanarayana, M ^a   Rao, V Sasidhara ^a   Sharma, A K ^a   Dey, Arjun ^a  

^a INDIAN SPACE RESEARCH ORGANISATION   (India)

^b SRI VENKATESWARA UNIVERSITY   (India)

^c JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH   (India)

Author keywords

B. Microstructure; C. IR emittance; C. Solar absorptance; D. SiO 2 Al2O3; Rf magnetron sputtering; Thin film

Indexed keywords

D. SIO 2-AL2O3; EMITTANCES; ENERGY DISPERSIVE X RAY SPECTROSCOPY; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; OPERATING TEMPERATURE; RF-MAGNETRON SPUTTERING; SOLAR ABSORPTANCE; SPACECRAFT SUBSYSTEMS;

ALUMINUM; ATOMIC FORCE MICROSCOPY; FIELD EMISSION MICROSCOPES; MAGNETRON SPUTTERING; MICROSTRUCTURE; THIN FILMS; TOPOGRAPHY; X RAY SPECTROSCOPY;

DEPOSITION;

EID: 84880323924     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2013.02.082     Document Type: Article

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