Thin film complementary metal oxide semiconductor (CMOS) device using a single-step deposition of the channel layer

Scientific Reports

Volumn 4, Issue , 2014, Pages

  Nayak, Pradipta K ^a   Caraveo Frescas, J A ^a   Wang, Zhenwei ^a   Hedhili, M N ^a   Wang, Q X ^a   Alshareef, H N ^a  

^a KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Saudi Arabia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84898638003     PISSN: None     EISSN: 20452322     Source Type: Journal    
DOI: 10.1038/srep04672     Document Type: Article

References (30)

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