Temperature dependence on p-Cu 2 O thin film electrochemically deposited onto copper substrate

Applied Surface Science

Volumn 301, Issue , 2014, Pages 369-377

  Huang, Mao Chia ^a   Wang, Tsinghai ^b   Chang, Wen Sheng ^c   Lin, Jing Chie ^a   Wu, Ching Chen ^c   Chen, I Chen ^a   Peng, Kun Cheng ^d   Lee, Sheng Wei ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^d MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Electrochemical deposition; Electroplating temperature; Photoelectrochemistry

Indexed keywords

CARRIER CONCENTRATION; COPPER; CRYSTAL ORIENTATION; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMISTRY; REDUCTION; TEMPERATURE DISTRIBUTION; THIN FILMS;

ELECTRODEPOSITION TEMPERATURE; ELECTROPLATING TEMPERATURE; PHOTO-ELECTROCHEMISTRY; PHOTOCURRENT DENSITY; PHOTOELECTROCHEMICAL PERFORMANCE; PHOTOELECTROCHEMICAL PROPERTIES; PREFERENTIAL ORIENTATION; TEMPERATURE DEPENDENCE;

COPPER OXIDES;

EID: 84897915041     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2014.02.085     Document Type: Conference Paper

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