Morphology evolutions and optical properties of Cu 2 O films by an electrochemical deposition on flexible substrate

Applied Surface Science

Volumn 258, Issue 7, 2012, Pages 3232-3236

  Zhai, Yuchun ^a,b   Fan, Huiqing ^a,b   Li, Qiang ^a,b   Yan, Wei ^a,b  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

^b SHENZHEN UNIVERSITY   (China)

Author keywords

Electrochemical deposition; Microstructure; Optical properties

Indexed keywords

COPPER OXIDES; ENERGY GAP; INDIUM COMPOUNDS; MICROSTRUCTURE; MORPHOLOGY; OPTICAL PROPERTIES; PLASTIC BOTTLES; REDUCTION; SCANNING ELECTRON MICROSCOPY; TIN OXIDES; X RAY DIFFRACTION;

CU2O FILMS; CUPROUS OXIDE; CYCLIC VOLTAMMOGRAMS; FLEXIBLE SUBSTRATE; INDIUM TIN OXIDE; MORPHOLOGY EVOLUTION; QUANTUM CONFINEMENT EFFECTS; ULTRAVIOLET-VISIBLE SPECTRA;

ELECTROCHEMICAL DEPOSITION;

EID: 84855552099     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.11.070     Document Type: Article

References (37)

1. Y.S. Luo, and S.Q. Li Cryst. Growth Des. 7 2007 87 92
2. P. Jiang, J.F. Bertone, and V.L Colvin Science 291 2001 453 457
3. V.F. Puntes, K.M. Krishnan, and A.P. Alivisatos Science 291 2001 2115 2117
4. C.J. Murphy, and N.R. Jana Adv. Mater. 14 2002 80 82
5. Y. Jun, J. Seo, S.J. Oh, and J. Cheon Coord. Chem. Rev. 249 2005 1766 1775
6. Y.Y. Ma, and Z.Y. Jiang J. Phys. Chem. C 112 2008 13405 13409
7. S. Joseph, and P.V. Kamath Solid State Sci. 10 2008 1215 1221
8. D.P. Singh, and N.R. Neti J. Phys. Chem. C 111 2007 1638 1645
9. S. Bijani, L. Martinez, M. Gabas, E.A. Dalchiele, and J.R. Ramos-Barrado J. Phys. Chem. C 113 2009 19482 19487
10. S.O. Kang, S. Hong, J. Choi, J.S. Kim, I. Hwang, L.S. Byun, and K.S. Yun Appl. Phys. Lett. 95 2009 92 108
11. P. Poizot, S. Laruelle, S. Grugeon, L. Dupont, and J.M. Taracon Nature 407 2000 496 499
12. J. Zhang, J. Liu, Q. Peng, X. Wang, and Y. Li Chem. Mater. 18 2006 867 871
13. L.L. Ma, Y.L. Lin, Y. Wang, J.L. Li, Y.K. Wang, M.Q. Qiu, and Y. Yu J. Phys. Chem. C 112 2008 18916 18922
14. M.J. Siegfried, and K.S. Choi Adv. Mater. 16 2004 1743 1746
15. S. Ishizuka, T. Maruyama, and K. Jpn Akimoto J. Appl. Phys. 39 2000 786 788
16. J.K. Barton, A.A. Vertegel, E.W. Bohannan, and J.A. Switzer Chem. Mater. 13 2001 952 959
17. R. Liu, E.A. Kulp, F. Oba, E.W. Bohannan, F. Ernst, and J.A. Switzer Chem. Mater. 17 2005 725 729
18. F. Oba, F. Ernst, Y. Yu, R. Liu, H.M. Kothari, and J.A. Switzer J. Am. Ceram. Soc. 88 2005 253 270
19. F. Caballero-Briones, J.M. Artes, I. Diez-Perez, P. Gorostiza, and F. Sanz J. Phys. Chem. C 113 2009 1028 1036
20. J. Kunze, V. Maurice, L.H. Klein, H.H. Strehblow, and P.J. Marcus Electroanal. Chem. 113 2003 554 555
21. J. Eskhult, and L.J. Nyholm Electrochem. Soc. 2 2008 115 122
22. Y.M. Sui, W.Y. Fu, H.B. Yang, Y. Zeng, Y.Y. Zhang, Q. Zhao, Y.L. Li, X.M. Zhou, Y. Leng, M.H. Li, and G.G. Zou Cryst. Growth Des. 10 2010 99 108
23. G.Z. Wulff Krystsllogr. 34 1901 449 530
24. X. Zhao, Z.Y. Bao, C.T. Sun, and D.F. Xue J. Cryst. Growth 311 2009 711 715
25. M.M. Islam, B. Diawaro, V. Maurice, and P. Marcus Surf. Sci. 603 2009 2087 2095
26. D. Le, S. Stolbov, and T.S. Rahman Surf. Sci. 603 2009 1637 1645
27. K.H. Schulz, and D.F. Cox Phys. Rev. B 43 1991 1610 1621
28. K.H. Schulz, and D.F. Cox Surf. Sci. 256 1991 67 76
29. P. Mcfadyen, and E.J. Matijevilc Colloid Interface. Sci. 44 1973 95 106
30. S. Matthew, and J.C. Kyoung-shin Adv. Mater. 16 2004 1743 1746
31. Z.L. Wang J. Phys. Chem. B 104 2000 1153 1175
32. L.E. Brus J. Chem. Phys. 80 1984 4403 4409
33. K.F. Lin, H.M. Cheng, H.C. Hsu, L.J. Lin, and W.F. Hsieh Chem. Phys. Lett. 409 2005 208 211
34. S. Tsunekawa, T. Fukuda, and A. Kasuya J. Appl. Phys. 87 2000 1318 1321
35. E.M. Wong, and P.C. Searson Appl. Phys. Lett. 74 1999 2939 2941
36. C.B. Murray, D.J. Norris, and M.G. Bawendi J. Am. Chem. Soc. 115 1993 8706 8715
37. M.A. Malik, P. O'Brien, and N. Revaprasadu Adv. Mater. 11 1999 1441 1444