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Journal of Materials Chemistry

Volumn 21, Issue 10, 2011, Pages 3467-3470

Electrochemical deposition of Cl-doped n-type Cu2O on reduced graphene oxide electrodes

(6) Wu, Shixin a Yin, Zongyou a He, Qiyuan a Lu, Gang a Zhou, Xiaozhu a Zhang, Hua a,b

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CL-DOPED; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL METHODS; OXIDE ELECTRODES; SEMICONDUCTOR OXIDES; STRUCTURE AND PROPERTIES;

CARRIER CONCENTRATION; DOPING (ADDITIVES); ELECTROCHEMICAL PROPERTIES; ELECTROCHEMISTRY; ELECTRODEPOSITION; GRAPHENE; MATERIALS PROPERTIES; REDUCTION;

ELECTROCHEMICAL ELECTRODES;

EID: 79951929544 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c0jm02267e Document Type: Article

Times cited : (98)

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