Photoelectrochemical stability of electrodeposited Cu2O films

Journal of Physical Chemistry C

Volumn 114, Issue 26, 2010, Pages 11551-11556

  Wu, Lingling ^a   Tsui, Lok Kun ^a   Swami, Nathan ^a   Zangari, Giovanni ^a  

^a University of Virginia   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AQUEOUS SOLUTIONS; AS-DEPOSITED FILMS; COLUMNAR MORPHOLOGY; CRYSTALLOGRAPHIC FACETS; CUPROUS OXIDE; DENSE STRUCTURES; ELECTRODEPOSITED FILMS; ENERGY DIFFERENCES; FILM MORPHOLOGY; P-TYPE; PHOTOELECTROCHEMICAL RESPONSE; PHOTOELECTROCHEMICALS; PREFERRED ORIENTATIONS; RECOMBINATION LOSS; STABLE NETWORK; SURFACE AREA; VOLTAGE WINDOW;

CORROSION; CRYSTAL STRUCTURE; ELECTRODEPOSITION; MORPHOLOGY; OXIDE FILMS;

COPPER;

EID: 77954255989     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp103437y     Document Type: Article

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