Tungsten hexacarbonyl and hydrogen peroxide as precursors for the growth of tungsten oxide thin films on titania nanoparticles

AIChE Journal

Volumn 60, Issue 4, 2014, Pages 1278-1286

  Jackson, David H K ^a   Dunn, Bryan A ^a   Guan, Yingxin ^a   Kuech, Thomas F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

Catalysis; Materials; Nanotechnology

Indexed keywords

ALD PRECURSOR; CHEMICAL VAPOR; FLUIDIZED BED REACTORS; HIGH-TEMPERATURE ANNEALING; REACTION MECHANISM; TITANIA NANO-PARTICLES; TUNGSTEN HEXACARBONYL; TUNGSTEN OXIDE THIN FILMS;

AMORPHOUS FILMS; ATOMIC LAYER DEPOSITION; CATALYSIS; CHEMICAL VAPOR DEPOSITION; FLUID CATALYTIC CRACKING; MATERIALS; NANOTECHNOLOGY; OXIDE MINERALS; POWDERS; SURFACE REACTIONS; TITANIUM DIOXIDE;

INTERFACES (MATERIALS);

EID: 84897626647     PISSN: 00011541     EISSN: 15475905     Source Type: Journal    
DOI: 10.1002/aic.14397     Document Type: Article

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