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Applied Organometallic Chemistry

Volumn 12, Issue 3, 1998, Pages 155-160

Chemical Vapor Deposition of Tungsten Oxide

(2) Kirss, Rein U a Meda, Lamartine a

a NORTHEASTERN UNIVERSITY (United States)

Author keywords

Chemical vapor deposition (CVD); Electrochromism; Thin films; Tungsten trioxide

Indexed keywords

EID: 0000925935 PISSN: 02682605 EISSN: None Source Type: Journal
DOI: 10.1002/(SICI)1099-0739(199803)12:3<155::AID-AOC688>3.0.CO;2-Z Document Type: Article

Times cited : (40)

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