Study of the surface roughness of CVD-tungsten oxide thin films

Applied Surface Science

Volumn 218, Issue 1-4, 2003, Pages 163-169

  Tanner, R E ^a,b   Szekeres, A ^c   Gogova, D ^d   Gesheva, K ^d  

^a UNIVERSITY OF WARWICK   (United Kingdom)

^b Yale University   (United States)

^c INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^d CTRL LAB SOLAR ENER NEW ENER S   (Bulgaria)

Author keywords

Atomic force microscopy; Morphology and growth; Surface; Tungsten oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; PYROLYSIS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; TUNGSTEN COMPOUNDS;

TUNGSTEN OXIDES;

THIN FILMS;

EID: 0041692927     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00575-0     Document Type: Article

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