Tungsten chemical vapor deposition using tungsten hexacarbonyl: microstructure of as-deposited and annealed films

Thin Solid Films

Volumn 370, Issue 1, 2000, Pages 114-121

  Lai, Ken K ^a   Lamb, H Henry ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; ELECTRIC CONDUCTIVITY OF SOLIDS; MORPHOLOGY; PHASE TRANSITIONS; POLYCRYSTALLINE MATERIALS; THERMAL EFFECTS; TUNGSTEN; VACUUM APPLICATIONS;

CHEMICAL PURITY; SUBSTRATE TEMPERATURE; TUNGSTEN HEXACARBONYL; ULTRAHIGH VACUUM COMPATIBLE REACTOR;

THIN FILMS;

EID: 0033688522     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00943-3     Document Type: Article

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