Dissipation in ultrahigh quality factor SiN membrane resonators

Physical Review Letters

Volumn 112, Issue 12, 2013, Pages

  Chakram, S ^a   Patil, Y S ^a   Chang, L ^a   Vengalattore, M ^a  

^a Laboratory of Atomic and Solid State Physics and Sibley School of Mechanical and Aerospace Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES; MACHINE DESIGN; MECHANICAL PROPERTIES; SILICON NITRIDE;

DISSIPATION MECHANISM; INTERFEROMETRIC IMAGING; MACROSCOPIC MECHANICAL SYSTEMS; QUALITY FACTORS; QUANTUM BEHAVIORS; ROOM TEMPERATURE; SUBSTRATE DESIGN; SUBSTRATE GEOMETRY;

RESONATORS;

EID: 84897427954     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.112.127201     Document Type: Article

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