The development of a 200kV monochromated field emission electron source

Ultramicroscopy

Volumn 140, Issue , 2014, Pages 37-43

  Mukai, Masaki ^a   Kim, Judy S ^b   Omoto, Kazuya ^a   Sawada, Hidetaka ^a   Kimura, Atsushi ^a   Ikeda, Akihiro ^a   Zhou, Jun ^a   Kaneyama, Toshikatsu ^a   Young, Neil P ^b   Warner, Jamie H ^b   Nellist, Peter D ^b   Kirkland, Angus I ^b  

^a JEOL LTD   (Japan)

^b UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

Aberration correction; Electron energy loss spectroscopy; Energy resolution; High resolution imaging; Monochromator; Wien filter

Indexed keywords

ELECTRON ENERGY LOSS SPECTROSCOPY; IMAGE RECONSTRUCTION; PROBES; SILICON;

ABERRATION CORRECTION; ABERRATION-CORRECTED; BROAD-BEAM ILLUMINATION; ENERGY DISPERSIONS; ENERGY RESOLUTIONS; FIELD EMISSION ELECTRON SOURCES; HIGH-RESOLUTION IMAGING; WIEN FILTERS;

MONOCHROMATORS;

ARTICLE; CONTROLLED STUDY; ELECTRIC FIELD; ELECTRIC POTENTIAL; ELECTRON MICROSCOPE; ENERGY; ENERGY DISPERSION; ENERGY RESOLUTION; ENERGY SPREAD; FIELD EMISSION; FILTER; ILLUMINATION; INTERMEDIATE VOLTAGE ABERRATION CORRECTED ELECTRON MICROSCOPE; MAGNETIC FIELD; MEASUREMENT; MONOCHROMATOR; OPTICAL INSTRUMENTATION; SCANNING TRANSMISSION ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; WIEN FILTER;

EID: 84896505308     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2014.02.004     Document Type: Article

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