The structure and photoelectrochemistry of Al, Ti Co-doped zinc oxide thin films prepared by sol-gel dip-coating process

Nanoscience and Nanotechnology Letters

Volumn 6, Issue 3, 2014, Pages 210-215

  Huang, Mao Chia ^a   Wang, Tsing Hai ^b   Cheng, Shuo Han ^a   Lin, Jing Chie ^a   Lan, Wei Hsuan ^a   Wu, Ching Chen ^c   Chang, Wen Sheng ^c  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Al; ATZO; Photoelectrochemistry.; Ti; Water Splitting; ZnO

Indexed keywords

EID: 84894683197     PISSN: 19414900     EISSN: 19414919     Source Type: Journal    
DOI: 10.1166/nnl.2014.1754     Document Type: Article

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