Growth and characterization of ZnO and Mg xZn 1-xO thin films by aerosol assisted chemical vapor deposition technique

Thin Solid Films

Volumn 520, Issue 9, 2012, Pages 3505-3509

  Kaushik, Vipin K ^a   Ganguli, Tapas ^b   Kumar, Ravi ^b   Mukherjee, C ^b   Sen, P K ^a  

^a SHRI G S INSTITUTE OF TECHNOLOGY AND SCIENCE   (India)

^b RAJA RAMANNA CENTRE FOR ADVANCED TECHNOLOGY   (India)

Author keywords

Aerosol assisted chemical vapor deposition; Atomic force microscopy; Magnesium zinc oxide; Polycrystalline films; Surface morphology; Thin films; X ray diffraction; Zinc oxide

Indexed keywords

ABSORBANCES; ABSORPTION COEFFICIENTS; AEROSOL-ASSISTED CHEMICAL VAPOR DEPOSITIONS; ATOMIC FORCE; CARRIER GAS; CRYSTALLOGRAPHIC STRUCTURE; ENERGY BANDGAPS; ENVELOPE METHOD; GLASS SUBSTRATES; GROWTH PARAMETERS; HIGH TRANSMITTANCE; INFRARED REGIONS; ISOPROPYL ALCOHOLS; MAGNESIUM ACETATES; MG CONTENT; POLYCRYSTALLINE; POLYCRYSTALLINE FILM; SUBSTRATE SURFACE; SYSTEMATIC CHANGES; THICKNESS OF THE FILM; TRANSMITTANCE SPECTRA; VISIBLE REGION; X-RAY DIFFRACTION METHOD; ZNO;

ATMOSPHERIC AEROSOLS; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; MAGNESIUM; SUBSTRATES; SURFACE MORPHOLOGY; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

THIN FILMS;

EID: 84863407064     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.12.075     Document Type: Article

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