Validation of thermodesorption method for analysis of semi-volatile organic compounds adsorbed on wafer surface

Talanta

Volumn 122, Issue , 2014, Pages 63-69

  Hayeck, Nathalie ^a,b   Gligorovski, Sasho ^a   Poulet, Irène ^b   Wortham, Henri ^a  

^a CNRS   (France)

^b TERA Environnement   (France)

Author keywords

Automated Thermal Desorber Gas chromatography Mass spectrometry; Organophosphorus compounds; Phthalate ester; Wafer contamination; Wafer Outgassing System

Indexed keywords

CONTAMINATION; DESORPTION; ESTERS; MASS SPECTROMETRY; PHOSPHORUS COMPOUNDS; PLASTICIZERS; VOLATILE ORGANIC COMPOUNDS;

GAS CHROMATOGRAPHY-MASS SPECTROMETRY; ORGANOPHOSPHORUS COMPOUNDS; PHTHALATE ESTER; WAFER CONTAMINATION; WAFER OUTGASSING SYSTEM;

GAS CHROMATOGRAPHY;

VOLATILE ORGANIC COMPOUND;

ADSORPTION; DIFFERENTIAL SCANNING CALORIMETRY; MASS FRAGMENTOGRAPHY; PROCEDURES; SURFACE PROPERTY; VALIDATION STUDY;

ADSORPTION; DIFFERENTIAL THERMAL ANALYSIS; GAS CHROMATOGRAPHY-MASS SPECTROMETRY; SURFACE PROPERTIES; VOLATILE ORGANIC COMPOUNDS;

EID: 84893759865     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.talanta.2014.01.029     Document Type: Article

References (23)

1. K.J. Budde, W.J. Holzapfel, and M.M. Beyer J. Electrochem. Soc. 142 3 1995 888 897
2. A.J. Muller, L.A. Psota-Kelty, H.W. Krautter, and J.D. Sinclair Solid State Technol. 1994 61 72
3. T.Q. Nguyen, H. Fontaine, T. Borde, and V. Jacob Microelectron. Eng. 105 2013 124 129
4. T. Staaf, and C. Ostman J. Environ. Monit. 7 2005 883 887
5. A. Sjodin, H. Carlsson, K. Thuresson, S. Sjolin, A. Bergman, and C. Ostman Environ. Sci. Technol. 35 2001 448 454
6. M. Garcia, I. Rodriguez, and R. Cela Anal. Chim. Acta 590 2007 17 25
7. O.B. Jonsson, and U.L. Nilsson Anal. Bioanal. Chem. 377 2003 182 188
8. H. Carlsson, U. Nilsson, G. Becker, and C. Ostman Environ. Sci. Technol. 31 1997 2931 2936
9. H. Carlsson, U. Nilsson, and C. Ostman Environ. Sci. Technol. 34 2000 3885 3889
10. C.J. Salim, H. Liu, and J.F. Kennedy Carbohydr. Polym. 81 3 2010 640 644
11. A. Marklund, B. Andersson, and P. Haglund Chemosphere 53 9 2003 1137 1146
12. Y. Kang, W. Den, H. Bai, and F.-H. Ko J. Chromatogr. A 1070 2005 137 145
13. M. Tamaoki, K. Nishiki, A. Shimazaki, Y. Sasaki, S. Yanagi, The effect of airborne contaminants in the cleanroom for ULSI manufacturing process, in: Proceedings of the Advanced Semiconductor Manufacturing Conference and Workshop, 1995, pp. 322-326.
14. W. Den, H. Bai, and Y. Kang J. Electrochem. Soc. 153 2006 G149 G159
15. J. Lebens, W. McColgin, and J. Russell J. Electrochem. Soc. 143 9 1996 2906 2909
16. S. Tlili, N. Hayeck, S. Gligorovski, and H. Wortham Ind. Eng. Chem. Res. 51 2012 14665 14672
17. L.I. Nieto-Gligorovski, S. Gligorovski, S. Tlili, X. Fu, B. Temime-Roussel, and H. Wortham J. Electrochem. Soc. 156 4 2009 H290 H297
18. H. Habuka, M. Shimada, and K. Okuyama J. Electrochem. Soc. 147 6 2000 2319 2323
19. U.P. Agency, Compedium Method TO-17, Center for Environmental Research Information Office of Research and Development, Cincinnati, 1999.
20. ASTM, Standard test methods for analyzing organic contaminants on silicon wafer surfaces by thermal desorption gas chromatography, 1999.
21. SEMI, Test method for the assessment of outgassing organic contamination from minienvironments using gas chromatography mass spectroscopy, 2001.
22. S. Tlili, L.I. Nieto-Gligorovski, B. Temime-Rousell, S. Gligorovski, and H. Wortham J. Electrochem. Soc. 157 5 2010 P43 P48
23. S. Tlili, E. Gomez Alvarez, S. Gligorovski, and H. Wortham Chem. Eng. J. 187 2012 239 247