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Journal of the Electrochemical Society

Volumn 143, Issue 9, 1996, Pages 2906-2909

Unintentional doping of wafers due to organophosphates in the clean room ambient

(5) Lebens, J A a,c McColgin, W C a Russell, J B a Mori, E J b,c Shive, L W b,c

a EASTMAN KODAK COMPANY (United States)

b MEMC Electronic Materials Inc (United States)

c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

AIR FILTERS; CLEAN ROOMS; ELECTRIC RESISTANCE MEASUREMENT; FABRICATION; FLAME RETARDANTS; GAS CHROMATOGRAPHY; IMPURITIES; OXIDATION; SECONDARY ION MASS SPECTROMETRY; SILICON WAFERS; VOLATILE ORGANIC COMPOUNDS;

FYROL; HIGH EFFICIENCY PARTICULATE AIR FILTERS; ORGANOPHOSPHATE;

SEMICONDUCTOR DOPING;

EID: 0030244894 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1837125 Document Type: Article

Times cited : (27)

References (10)

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10
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- McColgin, W.C.¹ Nichols, D.M.² Lebens, J.A.³

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