Well-controlled wet etching of ZnO films using hydrogen peroxide solution

Applied Surface Science

Volumn 292, Issue , 2014, Pages 34-38

  Wang, Yuchao ^a   Wu, Tianzhun ^b   Chen, Mingming ^a   Su, Longxing ^a   Zhang, Quanlin ^a   Yuan, Lifang ^a   Zhu, Yuan ^a   Tang, Zikang ^a,c  

^a SUN YAT SEN UNIVERSITY   (China)

^b SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY   (China)

^c HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

Hydrogen peroxide; Ultraviolet luminescence; Wet etching; Zinc oxide

Indexed keywords

HYDROGEN PEROXIDE; II-VI SEMICONDUCTORS; LUMINESCENCE; METALLIC FILMS; OPTOELECTRONIC DEVICES; OXIDATION; OXIDE MINERALS; PEROXIDES; SINGLE CRYSTALS; SPECTROMETERS; THIN FILMS; ZINC OXIDE;

ATOM FORCE MICROSCOPY (AFM); CONTROLLED WET ETCHINGS; ETCHING MECHANISM; ETCHING PERFORMANCE; SCANNING ELECTRONIC MICROSCOPY (SEM); SURFACE PROFILERS; ULTRAVIOLET LUMINESCENCE; ZNO SINGLE CRYSTALS;

WET ETCHING;

EID: 84893687948     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.11.053     Document Type: Article

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