Effect of total gas pressure and O2/N2 flow rate on the nanostructure of N-doped TiO2 thin films deposited by reactive sputtering

Thin Solid Films

Volumn 552, Issue , 2014, Pages 10-17

  Baker, M A ^a   Fakhouri, H ^b   Grilli, R ^a   Pulpytel, J ^b   Smith, W ^b   Arefi Khonsari, F ^b  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

Nitrogen doping; Titanium dioxide; XPS; XRD

Indexed keywords

ANATASE STRUCTURES; ATMOSPHERIC CONTAMINATION; DEPOSITION PRESSURES; FILM NANOSTRUCTURES; NITROGEN-DOPING; POST DEPOSITION ANNEALING; REACTIVE RF MAGNETRON SPUTTERING; XRD;

BINDING ENERGY; FLOW RATE; ION BOMBARDMENT; MAGNETRON SPUTTERING; NANOSTRUCTURES; PHOTOELECTRONS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; THIN FILMS; TITANIUM DIOXIDE; TITANIUM NITRIDE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION;

EID: 84892805975     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.11.111     Document Type: Article

References (36)

1. R. Asahi, T. Morikawa, T. Ohwaki, K. Aoki, and Y. Taga Science 293 2001 269
2. J. Šícha, J. Musil, M. Meissner, and R. Čerstvy Appl. Surf. Sci. 254 2008 3793
3. S.S. Pradhan, S.K. Pradhan, V. Bhavanasi, S. Sahoo, S.N. Sarangi, S. Anwar, and P.K. Barhai Thin Solid Films 520 2012 1809
4. P. Zeman, and S. Takabayashi Surf. Coat. Technol. 153 2002 93
5. J.O. Carniero, V. Teixeira, A.J. Martins, M. Mendes, M. Ribeiro, and A. Vieira Vacuum 83 2009 1303
6. S.-H. Lee, E. Yamasue, H. Okumura, and K.N. Ishihara Mater. Trans. 50 2009 1805
7. Z.G. Li, and S. Miyake Appl. Surf. Sci. 255 2009 9149
8. B. Liu, L. Wen, and X. Zhao Sol. Energy Mater. Sol. Cells 92 2008 1
9. M.-S. Wong, and H.P. Chou Thin Solid Films 494 2006 244
10. J.A. Thornton J. Vac. Sci. Technol. 11 1974 666
11. R. Asahi, and T. Morikawa Chem. Phys. 339 2007 57
12. L. Mi, P. Xu, and P.N. Wang Appl. Surf. Sci. 255 2008 2574
13. O. Diwald, T.L. Thompson, T. Zubkov, E.G. Goralski, S.D. Walck, and J.T. Yates Jr. J. Phys. Chem. B 108 2004 6004
14. I. Takahashi, D.J. Payne, R.G. Palgrave, and R.G. Egdell Chem. Phys. Lett. 454 2008 314
15. M. Batzill, E.H. Morales, and U. Diebold Chem. Phys. 339 2007 36
16. S.H. Cheung, P. Nachimuthu, A.G. Joly, M.H. Engelhard, M.K. Bowman, and S.A. Chambers Surf. Sci. 601 2007 1754
17. H. Matsui, H. Tabata, N. Hasuike, H. Harima, and B. Mizobuchi J. Appl. Phys. 97 2005 123511
18. H.M. Yates, M.G. Nolan, D.W. Sheel, and M.E. Pemble J. Photochem. Photobiol. A Chem. 179 2006 213
19. N.C. Saha, and H.G. Tompkins J. Appl. Phys. 72 1992 3072
20. M.A. Baker, T.P. Mollart, P.N. Gibson, and W. Gissler J. Vac. Sci. Technol. A 15 1997 284
21. T. Herranz, X. Deng, A. Cabot, Z. Liu, and M. Salmeron J. Catal. 283 2011 119
22. K. Obata, H. Irie, and K. Hashimoto Chem. Phys. 339 2007 124
23. R.G. Palgrave, D.J. Payne, and R.G. Edgell J. Mater. Chem. 19 2009 8418
24. M.-H. Chan, and F.-H. Lu Thin Solid Films 518 2009 1369
25. T. Kubart, T. Nyberg, and S. Berg J. Phys. D. Appl. Phys. 43 2010 205204
26. L.I. Vergara, I. Vaquila, and J. Ferron Appl. Surf. Sci. 151 1999 129
27. O.P. Ivanova, A.V. Naumkin, and L.A. Vasilyev Vacuum 46 1995 363
28. E.R. Fuoco, G. Gillen, M.B.J. Wijesundara, W.E. Wallace, and L. Hanley J. Phys. Chem. B 105 2001 3950
29. M.A. Baker, S.J. Greaves, E. Wendler, and V. Fox Thin Solid Films 377-378 2000 473
30. I.LeR. Strydom, and S. Hofmann J. Electron Spectrosc. Relat. Phenom. 56 1991 85
31. A.D. Yeadon, S.J. Wakeham, H.L. Brown, M.J. Thwaites, M.J. Whiting, and M.A. Baker Thin Solid Films 520 2011 1207
32. P.K. Barhai, N. Kumari, I. Banerjee, S.K. Pabi, and S.K. Mahapatra Vacuum 84 2010 896
33. J.S. Zabinski, J.J. Hu, J.E. Bultman, N.A. Pierce, and A.A. Voevodin Thin Solid Films 516 2008 6215
34. C. di Valentin, G. Pacchioni, A. Selloni, S. Livraghi, and E. Giamello J. Phys. Chem. B 109 2005 11414
35. F.E. Oropeza, J. Harmer, R.G. Egdell, and R.G. Palgrave Phys. Chem. Chem. Phys. 12 2010 960
36. N. Martin, R. Sanjinés, J. Takadoum, and F. Lévy Surf. Coat. Technol. 142-144 2001 615