Surface properties of doped and undoped TiO2 thin films deposited by magnetron sputtering

Vacuum

Volumn 83, Issue 10, 2009, Pages 1303-1306

  Carneiro, J O ^a   Teixeira, V ^a   Martins, A J ^a   Mendes, M ^a   Ribeiro, M ^b   Vieira, A ^b  

^a UNIVERSITY OF MINHO   (Portugal)

^b Centre for Nanotechnology and Smart Materials   (Portugal)

Author keywords

Contact angle; Fe doping effect; Photocatalytic activity; Sputtering pressure; Titanium dioxide

Indexed keywords

COATED SURFACE; CONTACT ANGLE ANALYSIS; DOPED-TIO; FE-DOPED TIO; FE-DOPING EFFECT; GLASS SLIDES; IRON CONCENTRATIONS; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC ACTIVITY; REACTIVE MAGNETRON SPUTTERING METHOD; RHODAMINE-B; SEM; SPUTTERING PRESSURE; SPUTTERING PRESSURES; SURFACE ENERGIES; TIO; UV LIGHT; UV VISIBLE SPECTROSCOPY;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CONTACT ANGLE; DOPING (ADDITIVES); LIGHT; MAGNETRONS; OXIDES; PHOTODEGRADATION; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SURFACE CHEMISTRY; SURFACE PROPERTIES; SURFACE TENSION; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

PHOTOCATALYSIS;

EID: 67349146454     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.03.028     Document Type: Article

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