메뉴 건너뛰기




Volumn 377-378, Issue , 2000, Pages 473-477

Comparison of in situ polishing and ion beam sputtering as surface preparation methods for XPS analysis of PVD coatings

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLISHING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; SURFACE CLEANING; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0034515520     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01272-4     Document Type: Article
Times cited : (27)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.