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Volumn 377-378, Issue , 2000, Pages 473-477
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Comparison of in situ polishing and ion beam sputtering as surface preparation methods for XPS analysis of PVD coatings
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Author keywords
[No Author keywords available]
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Indexed keywords
ION BEAMS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLISHING;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SPUTTER DEPOSITION;
SURFACE CLEANING;
TITANIUM NITRIDE;
X RAY PHOTOELECTRON SPECTROSCOPY;
ION BEAM SPUTTERING;
CERAMIC COATINGS;
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EID: 0034515520
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(00)01272-4 Document Type: Article |
Times cited : (27)
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References (15)
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