High-temperature stability of PECVD-derived organosilica membranes deposited on TiO2 and SiO2-ZrO2 intermediate layers using HMDSO/Ar plasma

Separation and Purification Technology

Volumn 121, Issue , 2014, Pages 13-19

  Nagasawa, Hiroki ^a   Minamizawa, Toshihiro ^a   Kanezashi, Masakoto ^a   Yoshioka, Tomohisa ^a   Tsuru, Toshinori ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Gas separation; High temperature stability; Plasma enhanced chemical vapor deposition; Porous organosilica membrane

Indexed keywords

AFTER-HEAT TREATMENT; DIFFERENT PORE SIZES; GAS PERMEATION CHARACTERISTICS; GAS SEPARATIONS; HEXAMETHYL DISILOXANE; HIGH TEMPERATURE STABILITY; ORGANOSILICAS; TEMPERATURE DEPENDENCE;

ALUMINA; HEAT TREATMENT; PERMEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SOL-GEL PROCESS; SULFUR HEXAFLUORIDE; THERMODYNAMIC STABILITY; TITANIUM DIOXIDE; VAPORS; ZIRCONIUM ALLOYS;

GAS PERMEABLE MEMBRANES;

EID: 84892438533     PISSN: 13835866     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.seppur.2013.10.042     Document Type: Article

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