Gas permeation of PECVD membranes inside alumina substrate tubes

Separation and Purification Technology

Volumn 25, Issue 1-3, 2001, Pages 399-406

  Pages X ^a   Rouessac, V ^a   Cot, D ^a   Nabias, G ^a   Durand, J ^a  

^a UNIV MONTPELLIER   (France)

Author keywords

Gas separation; Membrane; Plasma; Selectivity; Silicon carbide

Indexed keywords

DEPOSITION; DIFFUSION; HEATING; MORPHOLOGY; SILICON CARBIDE; THIN FILMS;

GAS PERMEATION;

ALUMINA;

CHEMICAL VAPOR DEPOSITION; GAS PERMEATION; MEMBRANE; SILICON CARBIDE;

EID: 0035482616     PISSN: 13835866     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1383-5866(01)00068-5     Document Type: Article

References (27)