Comparison between SiOC thin films fabricated by using plasma enhance chemical vapor deposition and SiO2 thin films by using fourier transform infrared spectroscopy

Journal of the Korean Physical Society

Volumn 56, Issue 4, 2010, Pages 1150-1155

  Teresa, O H ^a   Choi, Chi Kyu ^b  

^a Chongju University   (South Korea)

^b Jeju National University   (South Korea)

Author keywords

Ftir spectra; Low k; Si o c bond; Sio2 film; Sioc film

Indexed keywords

EID: 77954852712     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.56.1150     Document Type: Article

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