In situ measurement of the ion incidence angle dependence of the ion-enhanced etching yield in plasma reactors

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 6, 2006, Pages 2176-2186

  Belen, Rodolfo Jun ^a   Gomez, Sergi ^a   Kiehlbauch, Mark ^b   Aydil, Eray S ^c  

^a University of California   (United States)

^b LAM RESEARCH CORPORATION   (United States)

^c University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING YIELD; ION INCIDENCE ANGLE; ISOTROPIC PLASMA ETCHING; PLASMA REACTORS;

BINARY MIXTURES; ETCHING; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SULFUR COMPOUNDS;

PLASMA DEVICES;

EID: 33750949603     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2362725     Document Type: Article

References (14)

1. C. Steinbruchel, Appl. Phys. Lett. 55, 1960 (1989).
2. D. P. Hamblen and A. Chalin, J. Electrochem. Soc. 135, 1816 (1988).
3. D. C. Gray, I. Tepermeister, and H. H. Sawin, J. Vac. Sci. Technol. B 11, 1243 (1993).
4. S. Gomez, R. J. Belen, M. Kiehlbauch, and E. S. Aydil, J. Vac. Sci. Technol. A 22, 606 (2004).
5. S. A. Vitale, H. Chae, and H. H. Sawin, J. Vac. Sci. Technol. A 19, 2197 (2001).
6. M. A. Vyvoda, M. Li, D. B. Graves, H. Lee, M. V. Malyshev, F. P. Klemens, J. T. C. Lee, and V. M. Donnelly, J. Vac. Sci. Technol. B 18, 820 (2000).
7. D. J. Cooperberg, V. Vahedi, and R. A. Gottscho, J. Vac. Sci. Technol. A 20, 1536 (2002).
8. G. Marcos, A. Rhallabi, and P. Ranson, J. Vac. Sci. Technol. A 21, 87 (2003).
9. V. K. Singh, E. S. G. Shaqfeh, and J. P. McVittie, J. Vac. Sci. Technol. B 10, 1091 (1992).
10. R. J. Belen, S. Gomez, M. Kiehlbauch, D. Cooperberg, and E. S. Aydil, J. Vac. Sci. Technol. A 23, 99 (2005).
11. R. J. Belen, S. Gomez, M. Kiehlbauch, D. J. Cooperberg, and E. S. Aydil, J. Vac. Sci. Technol. A 23, 1530 (2005).
12. S. J. Ullal, A. R. Godfrey, E. Edelberg, L. Braly, V. Vahedi, and E. S. Aydil, J. Vac. Sci. Technol. A 20, 43 (2002).
13. S. J. Ullal, T. W. Kim, V. Vahedi, and E. S. Aydil, J. Vac. Sci. Technol. A 21, 589 (2003).
14. H. Sommerfeldt, E. S. Mashkova, and V. A. Molchanov, Phys. Lett. A 38, 237 (1972).