Influence of substrate bias and post-deposition Cl treatment on CdTe film grown by RF magnetron sputtering for solar cells

RSC Advances

Volumn 4, Issue 10, 2014, Pages 5046-5054

  Li, Hui ^a   Liu, Xiangxin ^a   Yang, Biao ^a   Wang, Pingjian ^b  

^a INSTITUTE OF ELECTRICAL ENGINEERING   (China)

^b All China Environment Federation (ACEF)   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TREATMENTS; CRYSTALLINE QUALITY; DEPOSITION PRESSURES; DEVICE PARAMETERS; DIFFERENT SUBSTRATES; INTERNAL STRUCTURE; RF-MAGNETRON SPUTTERING; SUBSTRATE POTENTIAL;

CADMIUM CHLORIDE; CRYSTALLINE MATERIALS; DEPOSITION; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MORPHOLOGY; PHASE COMPOSITION; SCANNING ELECTRON MICROSCOPY; SOLAR CELLS; SUBSTRATES; THIN FILMS;

CADMIUM TELLURIDE;

EID: 84891796263     PISSN: None     EISSN: 20462069     Source Type: Journal    
DOI: 10.1039/c3ra44831b     Document Type: Article

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