Changing TiN film morphology by "plasma biasing"

Journal of Applied Physics

Volumn 86, Issue 6, 1999, Pages 3460-3462

  Geng, J ^a   Schuler A ^a   Oelhafen, P ^a   Gantenbein, P ^b   Duggelin M ^a   Mathys, D ^a   Guggenheim, R ^a  

^a UNIVERSITY OF BASEL   (Switzerland)

^b SPF   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000046042     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371229     Document Type: Article

References (19)

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