Boron carbide thin film deposition using supersonic plasma jet with substrate biasing

Diamond and Related Materials

Volumn 8, Issue 10, 1999, Pages 1878-1884

  Postel, Olivier B ^a   Heberlein, Joachim V R ^a  

^a University of Minnesota   (United States)

Author keywords

Boron carbide; Deposition; Dissociation; Plasma jet; Thin films

Indexed keywords

ADHESION; CHEMICAL VARIABLES CONTROL; DEPOSITION; DISSOCIATION; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ION BOMBARDMENT; MORPHOLOGY; PLASMA JETS; SUBSTRATES; SUPERSONIC FLOW; THIN FILMS;

ELECTRON TEMPERATURE; GAS-PHASE CHEMISTRY; MICROCRYSTALLINE MATERIALS; THERMAL DISSOCIATION;

BORON CARBIDE;

EID: 0032646752     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00147-8     Document Type: Article

References (25)

1. Barsoum M. Fundamentals of Ceramics. 1997;202 McGraw-Hill, New York.
2. Makarenko G.N. Boron and Refractory Borides. 1977;34 Springer, Berlin.
3. Lartigue S., Male G. Rev. Int. Hautes Temp. Refract. 27:1991;43.
4. Tkachenko Y.G. Metall. 12:1984;41.
5. Galasso F.S. Chem. Vap. Depos. Mater. 112:1991.
6. Lee S., Ton T., Zych D., Dowben P.A. Mater. Res. Soc. Symp. Proc. 283:1993;483.
7. Ahmad A., Ianno N.J., Snyder P.G., Welipitiya D., Byun D., Dowben P.A. J. Appl. Phys. 79:1996;8643.
8. Byun D., Spady D.R., Ianno N.J., Dowben P.A. Nanostruct. Mater. 5:1995;465.
9. Hwang S., Byun D., Ianno N.J., Dowben P.A., Kim H.R. Appl. Phys. Lett. 68:1996;1495.
10. Lin S., Li D., Feldman B.J. Mater. Res. Soc. Symp. Proc. 383:1995;127.
11. Lee S., Mazurowski J., Ramseyer G., Dowben P.A. J. Appl. Phys. 72:1992;4925.
12. Deshpande S., Gulari E., Harris S., Weiner A. Appl. Phys. Lett. 65:1994;1757.
13. Mazurowski J., Lee S., Ramseyer G., Dowben P.A. Mater. Res. Soc. Symp. Proc. 242:1992;637.
14. Lee K.W., Harris S. Diamond Relat. Mater. 7:1998;1539.
15. Jankowski A.F., Schrawyer L.R., Wall M.A. J. Appl. Phys. 68:1990;5162.
16. Oliveira J.C., Oliveira M.N., Conde O. Surf. Coat. Technol. 80:1996;100.
17. Postel O., Otake N., Heberlein J. Proc. 13th Int. Symp. on Plasma Chemistry, Beijing, China, August. 1997;1088.
18. Postel O., Heberlein J. Surf. Coat. Technol. 108/109:1998;247.
19. Postel O., Heberlein J. IEEE Trans. Plasma Sci. 7:1999;100.
20. Bieberich M.T., Girshick S.L. Proc. 12th Int. Symp. on Plasma Chemistry, University of Minnesota, Minneapolis, August. 1995;937.
21. Oliver W.C., Pharr G.M. J. Mater. Res. 7:1992;1564.
22. Ichiki T., Momose T., Yoshida T. Jpn. J. Appl. Phys. I. 75:1994;1330.
23. Mirkarimi P.B., McCarty K.F., Friedmann T. J. Mater. Res. 9:1994;2925.
24. Ohring M. The Materials Science of Thin Films. 1992;Academic Press, Boston.
25. O. Postel, Ph.D. Thesis, University of Minnesota, 1998.