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Volumn , Issue , 2011, Pages 13-32

TSV-based 3D integration

Author keywords

[No Author keywords available]

Indexed keywords


EID: 84889818029     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1007/978-1-4419-0962-6_2     Document Type: Chapter
Times cited : (19)

References (26)
  • 2
    • 0022887691 scopus 로고
    • Three-dimensional IC trends
    • Akasaka Y (1986) Three-dimensional IC trends. Proc IEEE 74(12):1703-1714
    • (1986) Proc. IEEE , vol.74 , Issue.12 , pp. 1703-1714
    • Akasaka, Y.1
  • 9
    • 34250903413 scopus 로고    scopus 로고
    • 3-D interconnects using Cu wafer bonding: Technology and applications
    • Reif R et al (2002) 3-D interconnects using Cu wafer bonding: technology and applications. In: Advanced metallization conference (AMC)
    • (2002) Advanced Metallization Conference (AMC)
    • Reif, R.1
  • 13
    • 84889815079 scopus 로고    scopus 로고
    • Tezzaron Semiconductor, Naperville, IL 60563
    • Tezzaron Semiconductor, Naperville, IL 60563, http://www.tezzaron.com/ technology/FaStack.htm
  • 16
    • 0004245602 scopus 로고    scopus 로고
    • ITRS. Semiconductor Industry Association, San Jose, CA
    • (2008) International Technology Roadmap for Semiconductors: ITRS. Semiconductor Industry Association, San Jose, CA http://www.itrs.net/Links/ 2008ITRS/Home2008.htm
    • (2008) International Technology Roadmap for Semiconductors


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.