Optical Waveguide Growth and Applications

Pulsed Laser Deposition of Thin Films: Applications-Led Growth of Functional Materials

Volumn , Issue , 2006, Pages 383-420

  Eason, Robert W ^a   Barrington, Stephen J ^a   Grivas, Christos ^a   May Smith, Timothy C ^a   Shepherd, David P ^a  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

Optical waveguide growth and applications; PLD waveguide materials; Waveguide lasing devices

Indexed keywords

EID: 84889333863     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/9780470052129.ch17     Document Type: Chapter

References (112)

1. Afonso, C. N., Ballesteros, J. M., Gonzalo, J., Righini, G. C., and Pelli, S. (1996), Applied Surface Science 96-98, 760-763.
2. Agostinelli, J. A., Braunstein, G. H., and Blanton, T. N. (1993), Appl. Phys. Lett. 63, 123-125.
3. Alfonso, J. E., Martin, M. J., and Zaldo, C. (1997), Appl. Phys. Lett. 71, 2904-2906.
4. Anderson, A. A., Eason, R.W., Jelinek, M., Grivas, C., Hickey, L. M. B., Rogers, K., and Lane, D. (1997a), Thin Solid Films 300, 68-71.
5. Anderson, A. A., Bonner, C. L., Shepherd, D. P., Eason, R.W., Grivas, C., Gill, D. S., and Vainos, N. (1997b), Opt. Commun. 144, 183-186.
6. Anderson, A. A., Eason, R. W., Hickey, L. M. B., Jelinek, M., Grivas, C., Gill, D. S., and Vainos, N. A. (1997c), Opt. Lett. 22, 1556-1558.
7. Bae, S. H., Lee, S. Y., Jin, B. J., and Im, S. (2000), Applied Surface Scienc, 154, 458-461.
8. Bagnall, D. M., Ullrich, B., Sakai, H., and Segawa, Y. (2000), J. Crystal Growth 214, 1015-1018.
9. Barrington, S. J., and Eason, R. W. (2000), Rev. Sci. Instrum. 71, 4223-4225.
10. Barrington, S. J., Bhutta, J., Shepherd, D. P., and Eason, R. W. (2000), Opt. Commun. 185, 145-152.
11. Beckers, L., Buchal, C., Fluck, D., Pliska, T., and Gunter, P. (1998a), Mater. Sci. Eng. A. 253, 292-295.
12. Beckers, L., Schubert, J., Zander, W., Ziesmann, J., Eckau, A., Leinenbach, P., and Buchal, C. (1998b), J. Appl. Phys. 83, 3305-3310.
13. Betts, R. A., and Pitt, C. W. (1985), Electron. Lett. 21, 960-962.
14. Bhutta, T., Mackenzie, J. I., and Shepherd, D. P. (2002), J. Opt. Soc. Am. B 19, 1539-1543.
15. Bonner, C. L., Anderson, A. A., Eason, R.W., Shepherd, D. P., Gill, D. S., Grivas, C., and Vainos, N. (1997), Opt. Lett. 22, 988-990.
16. Bourquin, S., Laversenne, L., Rivier, S., Lasser, T., Salathé, R. P., Pollnau, M., Grivas, C., Shepherd, D. P., and Eason R. W. (2005), Proc. SPIE 5690, 209-213.
17. Brülisauer, S., Fluck, D., Solcia, C., Pliska, T., and Günter, P. (1995), Opt. Lett. 20, 1773-1775.
18. Buchal, C., Beckers, L., Eckau, A., Schubert, J., and Zander, W. (1998), Materials Science and Engineering B-Solid State Materials for Advanced Technolog, 56, 234-238.
19. Buryy, O. A., Ubiszkii, S. B., Melnyk, S. S., and Matkovskii, A. O. (2004), Appl. Phys. B. 78, 291-297.
20. Chaos, J. A., Pruneri, V., Gonzalo, J., and Afonso, C. N. (2000), J. Appl. Phys. 88, 3768-3770.
21. Chartier, I., Ferrand, B., Pelenc, D., Field, S. J., Hanna, D. C., Large, A. C., Shepherd, D. P., and Tropper, A. C. (1992), Opt. Lett. 17, 810-812.
22. Craciun, V., Howard, J., Lambers, E. S., Singh, R. K., Craciun, D., and Perriere, J. (1999), Appl. Phys. A-Mater. Sci. Process. 69, S535-S538.
23. Crunteanu, A., Pollnau, M., Janchen, G., Hibert, C., Hoffmann, P., Salathe, R. P., Eason, R. W., Grivas, C., and Shepherd, D. P. (2002), Appl. Phys. B-Lasers Opt. 75, 15-17.
24. Davis, G. M., and Gower, M. C. (1989), Appl. Phys. Lett. 55, 112-114.
25. Dyer, P. E.,Jackson, S. R., Key, P. H., Metheringham, W. J., and Schmidt, M. J. J. (1996), Appl. Surf. Sci. 96/98, 849-854.
26. Dyer, P. E., Gonzalo, J., Key, P. H., Sands, D., and Schmidt, M. J. J. (1997), Appl. Surf. Sci. 110, 345-349.
27. Ezaki, M., Kumagai, H., Kobayashi, K., Toyoda, K., and Obara, M. (1995), Jpn. J. Appl. Phys. Pt. 1-Regul. Pap. Short Notes Rev. Pap. 34, 6838-6841.
28. Ezaki, M., Obara, M., Kumagai, H., and Toyoda, K. (1996), Appl. Phys. Lett. 69, 2977-2979.
29. Fernandez, F. E., Gonzalez, Y., Liu, H. M., Martinez, A., Rodriguez, V., and Jia,W. Y. (2002), Integr. Ferroelectr. 42, 219-233.
30. Field, S. J., Hanna, D. C., Large, A. C., Shepherd, D. P., Tropper, A. C., Chandler, P. J., Townsend, P. J., and Zhang, L. (1991), Opt. Commun. 86, 161-166.
31. Findlay, D., and Clay, R. A. (1966), Phys. Lett. 20, 277-278.
32. Fukaya, S., Adachi, K., Obara, M., and Kumagai, H. (2001a), Opt. Commun. 187, 373-377.
33. Fukaya, S., Hasegawa, T., Ishida, Y., Shimoda, T., and Obara, M. (2001b), Appl. Surf. Sci. 177, 147-151.
34. Gill, D. S., Eason, R. W., Mendiola, J., and Chandler, P. J. (1995a), Mater. Lett. 25, 1-4.
35. Gill, D. S., Eason, R. W., Rutt, H. N., Zaldo, C., and Vainos, N. A. (1995b), J. Non-Crystal Sol. 191, 321-326.
36. Gill, D. S., Anderson, A. A., Eason, R. W., Warburton, T. J., and Shepherd, D. P. (1996), Appl. Phys. Lett. 69, 10-12.
37. Gonzalo, J., Chaos, J. A., Suarez-Garcia, A., Afonso, C. N., and Pruneri, V. (2002), Appl. Phys. Lett. 81, 2532-2534.
38. Grivas, C., Shepherd, D. P., May-Smith, T. C., Eason, R.W., Pollnau, M., Crunteanu, A., and Jelinek, M. (2003), IEEE J. Quant. Elec. 39, 501-507.
39. Grivas, C., May-Smith, T. C., Shepherd, D. P., and Eason, R. W. (2004), Opt. Commun. 229, 355-361.
40. Grivas, C., Shepherd, D. P., May-Smith, T. C., Eason, R. W., and Pollnau, M. (2005), Opt. Express 30, 210-215.
41. Guo, X. L., Liu, Z. G., Zhu, S. N., Yu, T., Xiong, S. B., and Hu, W. S. (1996), J. Crystal Growth 165, 187-190.
42. Hayashi, H., Iwasa, S., Vas, N. J., Yoshitake, T., Ueda, K., Yokoyama, S., Higuchi, S., Takeshita, H., and Nakahara, M. (2002a), Appl. Surf. Sci. 197, 463-466.
43. Hayashi, H., Iwasa, S., Vasa, N. J., Yoshitake, T., Ueda, K., Yokoyama, S., and Higuchi, S. (2002b), Jpn. J. Appl. Phys. Pt. 1-Regul. Pap. Short Notes Rev. Pap. 41, 410-411.
44. Higuchi, S., Ueda, K., Yahiro, F., Nakata, Y., Uetsuhara, H., Okada, T., and Maeda, M. (2201), IEEE Transactions on Magnetic 37, 2451-2453.
45. Hirata, G. A., Lopez, O. A., Shea, L. E., Yi, J. Y., Cheeks, T., McKittrick, J., Siqueiros, J., Avalos-Borja, M., Esparza, A., and Falcony, C. (1996), J. Vac. Sci. Technol. A-Vac. Surf. Films 14, 1694-1696.
46. Hu, W. S., Liu, Z. G., Sun, J., Guo, X. L., Yang, Z. J., Shi, L. J., and Feng, D. (1996), Materials Science and Engineering B-Solid State Materials for Advanced Technology 40, 165-169.
47. Hu, W. S., Liu, Z. G., Sun, J., Zhu, S. N., Xu, Q. Q., Feng, D., and Ji, Z. M. (1997), Journal of Physics and Chemistry of Solids 58, 853-857.
48. Ito, A., Machida, A., and Obara, M. (1997), Appl. Phys. Lett. 70, 3338-3340.
49. Jackel, J. L., Rice, C. E., and Veselka, J. J. (1982), Appl. Phys. Lett. 41, 607-608.
50. Jelinek, M., Eason, R. W., Lancok, J., Anderson, A. A., Grivas, C., Fotakis, C., Jastrabik, L., Flory, F., and Rigneault, H. (1998), Thin Solid Films 322, 259-262.
51. Jelinek, M., Klini, A., Grivas, C., Lancok, J., Studnicka,V., Chval, C., Mackova, A., and Fotakis, C. (2002a), Appl. Surf. Sci. 197/198, 416-420.
52. Jelinek, M., Lancok, J., Pavelka, M., Atanasov, P. A., Mackova, A., Flory, F., and Garapon, C. (2002b). Applied Physics A-Materials Science & Processing 74, 481-485.
53. Katoh, Y., Sugimoto, N., Tate, A., and Shibukawa, A. (1992), Jpn. J. Appl. Phys. Pt. 2-Lett. 31, L652-L654.
54. Katoh, Y., Sugimoto, N., Tate, A., and Shibukawa, A. (1993), Jpn. J. Appl. Phys. Pt. 2-Lett. 32, L508-L510.
55. Kidoh, H., Morimoto, A., and Shimizu, T. (1991), Appl. Phys. Lett. 59, 237-239.
56. Kim, D.W., Oh, S. M., Lee, S. H., and Noh, T.W. (1998), Jpn. J. Appl. Phys. Pt. 1-Regul. Pap. Short Notes Rev. Pap. 37, 2016-2020.
57. Korzenski, M. B., Lecoeur, P., Mercey, B., Camy, P., and Doualan, J. L. (2001), Appl. Phys. Lett. 78, 1210-1212.
58. Kumagai, H., Adachi, K., Ezaki, M., Toyoda, K., and Obara, M. (1997), Appl. Surf. Sci. 109/110, 528-532.
59. Lancok, J., Jelinek, M., Grivas, C., Flory, F., Lebrasseur, E., and Garapon, C. (1999), Thin Solid Films 346, 284-289.
60. Lancok, J., Garapon, C., Martinet, C., Mugnier, J., and Brenier, R. (2004), Appl. Phys. A 79, 1263-1265.
61. Lecoeur, P., Korzenski, M. B., Ambrosini, A., Mercey, B., Camy, P., and Doualan, J. L. (2002), Appl. Surf. Sci. 186, 403-407.
62. Lee, J. R., Baker, H. J., Friel, G. J., Hilton, G. J., and Hall, D. R. (2002), Opt. Lett. 27, 524-526.
63. Liao, H. B., Xiao, R. F., Yu, P., and Wong, G. K. L. (1997), J. Crystal Growth 174, 434-439.
64. Liu, J. M., Zhang, F., Liu, Z. G., Zhu, S. N., Shi, L. J.,Wu, Z. C., and Ming, N. B. (1994), Applied Physics Letters 65, 1995-1997.
65. Liu, J. M., Liu, Z. G., Zhu, S. N., Zhu, Y. Y., and Ming, N. B. (1996), Appl. Surf. Sci. 96/98, 819-822.
66. Lucuta, P. G., Halliday, J. D., and Christian, B. (1992), J. Mater. Sci. 27, 6053-6061.
67. Mackenzie, J. I., Li, C., and Shepherd, D. P. (2003), IEEE J. Quant. Electron. 39, 493-500.
68. Mailis, S., Anderson, A. A., Barrington, S. J., Brocklesby,W. S., Greef, R., Rutt, H. N., and Eason, R.W. (1998), Opt. Lett. 23, 1751-1753.
69. Mailis, S., Riziotis, C.,Wang, J., Taylor, E., Anderson, A. A., Barrington, S. J., Rutt, H. N., Eason, R.W., Vainos, N. A., and Grivas, C. (1999), Opt. Mater. 12, 27-33.
70. Mailis, S., Riziotis, C.,Wellington, I. T., Smith, P. G. R., Gawith, C. B. E., and Eason, R.W. (2003), Opt. Lett. 28, 1433-1435.
71. Manoravi, P., Willmott, P. R., Huber, J. R., and Greber, T. (1999), Appl. Phys. A 69, S865-S867.
72. May-Smith, T. C., Grivas, C., Shepherd, D. P., Eason, R. W., and Healy, M. J. F. (2004), Appl. Surf. Sci. 223, 361-371.
73. McKee, R. A., Walker, F. J., Conner, J. R., Specht, E. D., and Zelmon, D. E. (1991), Appl. Phys. Lett. 59, 782-784.
74. McFarlane, R. A., Lui, M., and Yap, D. (1995), IEEE J. Selected Top. Quant. Electron. 1, 82-91.
75. Muller, E. K., Nicholson, B. J., and Francombe, M. H. (1963), Electrochem. Technol. 1, 158.
76. Murakami, K. (1992), in Laser Ablation of Electronic Materials, E. Fogarassy and S. Lazare (Eds.), Elsevier, The Netherlands.
77. Noh, T.W., Lee, S. H., Kim, D.W., Oh, S. M., Lim, M. J., Lee, S. D., Han, S. H., andWu, J.W. (1998), J. Korean Phys. Soc. 32, S1307-S1310.
78. Nourshargh, N., Starr, E. M., Fox, N. I., and Jones, S. G. (1985), Electron. Lett., 21, 818-820.
79. Ohring, M. (1992), The Materials Science of Thin Films, Academic, San Diego.
80. Okamura, Y., Yoshinaka, S., and Yamamoto, S. (1983), Appl. Opt. 22, 3892-3894.
81. Perna, G., Capozzi, V., Pagliara, S., Ambrico, M., and Lojacono, D. (2001), Thin Solid Films 387, 208-211.
82. Petraru, A., Schubert, J., Schmid, M., and Buchal, C. (2002), Appl. Phys. Lett. 81, 1375-1377.
83. Pons-Y-Moll, O., Perriere, J., Millon, E., Defourneau, R. M., Defourneau, D., Vincent, B., Essahlaoui, A., Boudrioua, A., and Seiler, W. (2002), Journal of Applied Physics 92, 4885-4890.
84. Ramaswamy, R. V., and Najafi, S. I. (1986), IEEE J. Quant. Electron. 22, 883-891.
85. Ryu, Y. R., Zhu, S., Budai, J. D., Chandrasekhar, H. R., Miceli, P. F., and White, H.W. (2000), Journal of Applied Physics, 88, 201-204.
86. Schwyn-Thony, S., Lehmann, H. W., and Gunter, P. (1992), Physical and optical characterisation of epitaxial waveguiding KNbO3 thin films grown by sputter deposition, Conference on Lasers and Electro-optics (CLEO), paper CPD6, Anaheim, CA.
87. Schwyn-Thony, S., Youden, K. E., Harris, J. J. S., and Hesselink, L. (1994), Appl. Phys. Lett. 65, 2018-2020.
88. Serna, R., and Afonso, C. N. (1996), Appl. Phys. Lett. 69, 1541-1543.
89. Serna, R., Ballesteros, J. M., de Castro, M. J., Solis, J., and Afonso, C. N. (1998), J. Appl. Phys. 84, 2352-2354.
90. Shepherd, D. P., Hettrick, S. J., Li, C., Mackenzie, J. I., Beach, R. J., Mitchell, S. C., and Meissner, H. E. (2001), J. Phys. D. Appl. Phys. 34, 2420-2432.
91. Shibata, Y., Kaya, K., Akashi, K., Kanai, M., Kawai, T., and Kawai, S. (1993), Appl. Phys. Lett. 62, 3046-3048.
92. Shimoda, T., Ishida, Y., Adachi, K., and Obara, M. (2001), Opt. Commun. 194, 175-179.
93. Singh, S., Smith, R. G., and Van Uitert, L. G. (1974), Phys. Rev. B 10, 2566-2572.
94. Stewen, C., Contag, K., Larionov, M., Giesen, A., and Hugel, H. (2000), IEEE J. Sel. Top. Quant. Electron. 6, 650-656.
95. Studebaker, D. B., Stauf, G. T., Baum, T. H., Marks, T. J., Zhou, H., andWong, G. K. (1997), Appl. Phys. Lett. 70, 565-567.
96. Tang, Z. K.,Wong, G. K. L., Yu, P., Kawasaki, M., Ohtomo, A., Koinuma, H., and Segawa, Y. (1998), Appl. Phys. Lett. 72, 3270-3272.
97. Tomov, R. I., Kabadjova, T. K., Atanasov, P. A., Tonchev, S., Kaneva, M., Zherikhin, A., and Eason, R.W. (2000), Vacuum 58, 396-403.
98. Townsend, P. D. (1976), Inst. Phys. Conf. Ser. 28, 104-111.
99. Uetsuhara, H., Goto, S., Nakata, Y., Vasa, N., Okada, T., and Maeda, M. (1999), Appl. Phys. A 69, S719-S722.
100. Vainos, N. A., Grivas, C., Fotakis, C., Eason, R. W., Anderson, A. A., Gill, D. S., Shepherd, D. P., Jelinek, M., Lancok, J., and Sonsky, J. (1998), Appl. Surf. Sci. 129, 514-519.
101. Wada, M., and Miyazaki, Y. (1994), IEICE Trans. Electron. E77C, 1138-1145.
102. Wang, K., Shi, B., Cue, N., Zhu, Y., Xiao, R., Lu, F., Li,W., and Liu, Y. (1998), Appl. Phys. Lett. 73, 1020-1022.
103. Wang, K. M., Shi, B. R., Cue, N., Zhu, Y. Y., Xiao, R. F., Lu, F., Hu, H., and Liu, Y. G. (2001), J. Vac. Sci. Technol. A-Vac. Surf. Films 19, 394-397.
104. Wang, F. X., Li, W., Lu, F., Hu, H., Wang, J. M., Liu, Z. G., and Yong, Z. (2002), Nucl. Instrum. Methods Phys. Res. Sect. B-Beam Interact. Mater. Atoms 191, 778-782.
105. Weber, H. P., Dunn, F. A., and Leibolt, W. N. (1973), Appl. Opt. 12, 755.
106. Willmott, P. R., Manoravi, P., Huber, J. R., Greber, T., Murray, T. A., and Holliday, K. (1999), Opt. Lett. 24, 1581-1583.
107. Willmott, P. R., Manoravi, P., and Holliday, K. (2000), Appl. Phys. A-Mater. Sci. Process. 70, 425-429.
108. Xiong, F., Chang, R. P. H., Hagerman, M. E., Kozhevnikov, V. L., Poeppelmeier, K. R., Zhou, H., Wong, G. K., Ketterson, J. B., and White, C. W. (1994), Appl. Phys. Lett. 64, 161-163.
109. Youden, K. E., Grevatt, T., Eason, R.W., Rutt, H. N., Deol, R. S., and Wylangowski, G. (1993), Appl. Phys. Lett. 63, 1601-1603.
110. Yu, N., and Nastasi, M. (1994), Appl. Phys. Lett. 65, 180-182.
111. Zaldo, C., Gill, D. S., Eason, R. W., Mendiola, J., and Chandler, P. J. (1994), Appl. Phys. Lett. 65, 502-504.
112. Zhang, M. S., Zhang, P., Yin, Z., and Liu, J. (1999), Appl. Phys. A-Mater. Sci. Process. 69, 389-395.