Pulsed laser reactive ablation of (0001)-textured ZnO optical waveguiding films on α-SiO2

Materials Science and Engineering B

Volumn 40, Issue 2-3, 1996, Pages 165-169

  Hu, W S ^a   Liu, Z G ^a   Sun, J ^a   Guo, X L ^a   Yang, Z J ^a   Shi, L J ^b   Feng, D ^a  

^a NANJING UNIVERSITY   (China)

^b NANJING UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Pulsed laser reactive ablation; ZnO thin films

Indexed keywords

CRYSTAL MICROSTRUCTURE; ENERGY GAP; LASER ABLATION; OPACITY; OPTICAL WAVEGUIDES; PULSED LASER APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR GROWTH; SILICA; THIN FILMS; ZINC OXIDE;

PIEZOELECTRIC SEMICONDUCTOR; PULSED LASER REACTIVE ABLATION; REFLECTIVE INDICES; TRANSVERSE ELECTRIC MODES; X RAY REFLECTION;

SEMICONDUCTING FILMS;

EID: 0001143919     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-5107(96)01605-4     Document Type: Article

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