Electron scattering mechanisms in fluorine-doped SnO2 thin films

Journal of Applied Physics

Volumn 114, Issue 18, 2013, Pages

  Rey, G ^a   Ternon, C ^a,b   Modreanu, M ^c   Mescot, X ^d   Consonni, V ^a   Bellet, D ^a  

^a LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE   (France)

^b Laboratoire Interdisciplinaire de Physique   (France)

^c UNIVERSITY COLLEGE CORK   (Ireland)

^d GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFERENT MECHANISMS; ELECTROOPTICAL PROPERTIES; EXPERIMENTAL METHODOLOGY; GROWTH CONDITIONS; IONIZED IMPURITIES; PHYSICAL MECHANISM; SCATTERING MECHANISMS; ULTRASONIC SPRAY PYROLYSIS;

ELECTRIC PROPERTIES; ELECTRON SCATTERING; FLUORINE; OPTICAL PROPERTIES; SPRAY PYROLYSIS; SUBSTRATES; X RAY DIFFRACTION;

THIN FILMS;

EID: 84887926580     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4829672     Document Type: Article

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