Properties of heavily W-doped TiO2 films deposited on Al 2O3-deposited glass by simultaneous rf and dc magnetron sputtering

Ceramics International

Volumn 40, Issue 1 PART A, 2014, Pages 217-225

  Lin, Su Shia ^a  

^a NATIONAL CHI NAN UNIVERSITY   (Taiwan)

Author keywords

Film; Optical energy gap; Resistivity; Sputtering

Indexed keywords

ALUMINA; ALUMINUM OXIDE; CARRIER CONCENTRATION; ELECTRIC CONDUCTIVITY; ENERGY GAP; FILM THICKNESS; FILMS; GLASS; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; OXYGEN VACANCIES; SPUTTERING; SURFACE ROUGHNESS; TITANIUM DIOXIDE; TUNGSTEN COMPOUNDS;

DC MAGNETRON SPUTTERING; ELECTRICAL CONDUCTIVITY; HEAVILY DOPED; LOWER STRESS; MIXED VALENCE; OPTICAL COEFFICIENTS; OPTICAL ENERGY GAP; RF-MAGNETRON SPUTTERING;

OPTICAL FILMS;

EID: 84887628182     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2013.05.126     Document Type: Article

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