Structural and photoelectrochemical properties of Ti1-xWxO2 thin films deposited by magnetron sputtering

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Abadias, G ^a   Gago, A S ^a   Alonso Vante, N ^a  

^a UNIVERSITÉ DE POITIERS   (France)

Author keywords

Phase stability; Photoelectrochemistry; PVD; Solar hydrogen; W doped TiO2

Indexed keywords

ACID SOLUTIONS; AIR-ANNEALING; CANDIDATE MATERIALS; COATED GLASS; DOPED MATERIALS; DOPING CONTENT; MAGNETRON CO-SPUTTERING; MASS DENSITIES; METALLIC TARGETS; PHOTO-ELECTROCHEMISTRY; PHOTO-ELECTRODES; PHOTOCATALYTIC REACTIONS; PHOTOELECTROCHEMICAL PROPERTIES; PHOTORESPONSES; SOLAR HYDROGEN; TIO; TITANIUM TUNGSTEN; TRICLINIC STRUCTURES; UV-VIS LIGHT; X RAY REFLECTIVITY;

AMORPHOUS ALLOYS; ANNEALING; CATALYSTS; CRYSTAL STRUCTURE; ELECTROCHEMISTRY; FUEL CELLS; OXIDE MINERALS; PHASE STABILITY; SOLAR POWER GENERATION; THIN FILMS; TITANIUM; TITANIUM ALLOYS; TITANIUM DIOXIDE; TUNGSTEN; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

SEMICONDUCTOR DOPING;

EID: 79959773011     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.02.011     Document Type: Article

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