Tuning the dielectric properties of hafnium silicate films

Microelectronic Engineering

Volumn 84, Issue 12, 2007, Pages 2883-2887

  Fachmann, Christian ^a   Frey, Lothar ^a   Kudelka, Stephan ^a   Boescke, Tim ^a   Nawka, Stefan ^a   Erben, Elke ^a   Doll, Theodor ^b  

^a QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^b JOHANNES GUTENBERG UNIVERSITY   (Germany)

Author keywords

Crystalline phase; High k dielectrics; Leakage current; Permittivity

Indexed keywords

ANNEALING; DIELECTRIC FILMS; LEAKAGE CURRENTS; PERMITTIVITY; STABILIZATION; THERMODYNAMIC STABILITY;

CRYSTALLINE PHASE; HIGH-K DIELECTRICS;

HAFNIUM COMPOUNDS;

EID: 36148989156     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.02.011     Document Type: Article

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