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Volumn , Issue , 2012, Pages 346-353
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High-k/metal gates in leading edge silicon devices
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Author keywords
Advanced Materials; Advanced Processes; FEOL; Transistor Structures
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Indexed keywords
ADVANCED MATERIALS;
ADVANCED PROCESS;
CHIP PROCESS;
COMMERCIAL PRODUCTIONS;
FEOL;
GATE-LAST;
LEADING EDGE;
MANUFACTURING PROCESS;
METAL-GATE;
POLYSILICON GATES;
SILICON DEVICES;
TRANSISTOR STRUCTURE;
COMPETITION;
COMPETITIVE INTELLIGENCE;
MANUFACTURE;
POLYSILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
TRANSISTORS;
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EID: 84863914038
PISSN: 10788743
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ASMC.2012.6212925 Document Type: Conference Paper |
Times cited : (21)
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References (9)
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