Surface and Colloidal Chemical Aspects of Wet Cleaning

Handbook of Cleaning in Semiconductor Manufacturing: Fundamental and Applications

Volumn , Issue , 2011, Pages 3-37

  Raghavan, Srini ^a   Keswani, Manish ^a   Venkataraman, Nandini ^a  

^a University of Arizona   (United States)

Author keywords

Electrical double layer; High aspect ratio cleaning; Interfacial phenomena; Metal adsorption; Surface charging of metal oxide and nitride; Surface tension gradient drying; Wet cleaning

Indexed keywords

EID: 84885972230     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/9781118071748.ch1     Document Type: Chapter

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