Development of clean technology in wafer drying processes

Journal of Cleaner Production

Volumn 9, Issue 3, 2001, Pages 227-232

  Chang, In Soung ^a   Kim, Jae Hyung ^b  

^a Hoseo University   (South Korea)

^b Songkok Dong Ansan 425 110   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DRYING; ENERGY UTILIZATION; ORGANIC SOLVENTS; PROCESS ENGINEERING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

ISOPROPYL ALCOHOL;

CLEAN ROOMS;

EID: 0035372620     PISSN: 09596526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0959-6526(00)00055-X     Document Type: Article

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