Contamination of silicon dioxide films by aqueous zirconium and hafnium species

Journal of Applied Physics

Volumn 99, Issue 2, 2006, Pages

  Lowalekar, V ^a   Raghavan, S ^a   Pandit, V ^a   Parks, H G ^a   Jeon, J ^b  

^a University of Arizona   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION MEASUREMENTS; SILICON DIOXIDE FILMS; SPECIATION DIAGRAMS; WET ETCHING;

ADSORPTION; CONTAMINATION; DIELECTRIC MATERIALS; HAFNIUM; PH EFFECTS; SILICA; ZIRCONIUM;

THIN FILMS;

EID: 31644450285     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2160714     Document Type: Article

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