Growth of ultrathin amorphous alumina films during the oxidation of NiAl(100)

Surface Science

Volumn 618, Issue , 2013, Pages 20-26

  Cai, Na ^a   Qin, Hailang ^a   Tong, Xiao ^b   Zhou, Guangwen ^a  

^a State University of New York   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

Alumina; NiAl; Oxidation; Ultrathin oxide film

Indexed keywords

ALUMINA THIN FILMS; ALUMINUM OXIDE FILMS; EFFECT OF TEMPERATURE; ENHANCED DIFFUSION; NIAL; TEMPERATURE DEPENDENT; TRANSPORT VELOCITY; ULTRA-THIN OXIDE FILMS;

ALUMINUM; AMORPHOUS FILMS; INTERFACES (MATERIALS); OPTICAL FILMS; OXIDATION; OXIDE FILMS; PHOTOELECTRONS; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINA;

EID: 84885655950     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2013.09.011     Document Type: Article

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