X-ray Diffraction Study of the Ultrathin Al2O3 Layer on NiAl(110)

Science

Volumn 303, Issue 5664, 2004, Pages 1652-1656

  Stierle, A ^a   Renner, F ^a   Streitel, R ^a   Dosch, H ^a   Drube, W ^b   Cowie, B C ^c  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b DESY   (Germany)

^c EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSTS; CORROSION RESISTANCE; FILM GROWTH; NICKEL COMPOUNDS; PROBABILITY; ULTRATHIN FILMS; X RAY DIFFRACTION ANALYSIS;

GROWTH DEFECTS;

ALUMINA;

ALUMINUM OXIDE; METAL OXIDE;

SEMICONDUCTOR INDUSTRY; X-RAY DIFFRACTION;

ARTICLE; CALCULATION; DIFFUSION; FILM; MODEL; OXIDATION; PRIORITY JOURNAL; STRUCTURE ANALYSIS; TEMPERATURE; THICKNESS; X RAY DIFFRACTION;

EID: 1542408817     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.1094060     Document Type: Article

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