메뉴 건너뛰기




Volumn 3, Issue 4, 2013, Pages 1250-1258

Impact of impurities from crucible and coating on mc-silicon quality-The example of iron and cobalt

Author keywords

Crucible; iron; silicon; simulation; vertical gradient freeze (VGF)

Indexed keywords

IMPURITY CONCENTRATION; INDUCTIVELY COUPLED PLASMA MASS SPECTROSCOPIES; INTERSTITIAL IRON; LOW CONCENTRATIONS; MULTI-CRYSTALLINE SILICON; SENTAURUS PROCESS; SIMULATION; VERTICAL GRADIENT FREEZE;

EID: 84884670691     PISSN: 21563381     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPHOTOV.2013.2279116     Document Type: Article
Times cited : (63)

References (35)
  • 2
    • 77952776065 scopus 로고    scopus 로고
    • High-quality multicrystalline silicon growth for solar cells by grain-controlled directional solidification
    • K. M. Yeh, C. K. Hseih, W. C. Hsu, and C. W. Lan, "High-quality multicrystalline silicon growth for solar cells by grain-controlled directional solidification," Progr. Photovoltaics, vol. 18, pp. 265-271, 2010.
    • (2010) Progr. Photovoltaics , vol.18 , pp. 265-271
    • Yeh, K.M.1    Hseih, C.K.2    Hsu, W.C.3    Lan, C.W.4
  • 4
    • 27944483029 scopus 로고    scopus 로고
    • Increased wafer yield in silicon ingots by the applications of high purity silicon nitride-coating and high-purity crucibles
    • B. Geyer, G. Schwichtenberg, and A. M̈uller, "Increased wafer yield in silicon ingots by the applications of high purity silicon nitride-coating and high-purity crucibles," in Proc. IEEE 31st Photovoltaic Spec. Conf., 2005.
    • (2005) Proc. IEEE 31st Photovoltaic Spec. Conf
    • Geyer, B.1    Schwichtenberg, G.2    M̈uller, A.3
  • 5
    • 41049100677 scopus 로고    scopus 로고
    • Silicon nitride coating and crucible: Effects of using upgraded materials in the casting of multicrystalline silicon ingots
    • E. Olsen and E. J. Ovrelid, "Silicon nitride coating and crucible: Effects of using upgraded materials in the casting of multicrystalline silicon ingots," Progr. Photovoltaics, vol. 16, pp. 93-100, 2008.
    • (2008) Progr. Photovoltaics , vol.16 , pp. 93-100
    • Olsen, E.1    Ovrelid, E.J.2
  • 6
    • 59749101114 scopus 로고    scopus 로고
    • Influence of crucible and coating quality on the properties of multicrystalline silicon for solar cells
    • R. Kvande, L. Arnberg, and C. Martin, "Influence of crucible and coating quality on the properties of multicrystalline silicon for solar cells," J. Crystal Growth, vol. 311, pp. 765-768, 2009.
    • (2009) J. Crystal Growth , vol.311 , pp. 765-768
    • Kvande, R.1    Arnberg, L.2    Martin, C.3
  • 7
    • 67650149312 scopus 로고    scopus 로고
    • Origin of the low carrier lifetime edge zone in multicrystalline Pv silicon
    • T. Naerland, L. Arnberg, and A. Holt, "Origin of the low carrier lifetime edge zone in multicrystalline Pv silicon," Progr. Photovoltaics: Res. Appl., vol. 17, pp. 289-296, 2009.
    • (2009) Progr. Photovoltaics: Res. Appl , vol.17 , pp. 289-296
    • Naerland, T.1    Arnberg, L.2    Holt, A.3
  • 9
    • 42149093175 scopus 로고    scopus 로고
    • Imaging interstitial iron concentrations in boron-doped crystalline silicon unsing photoluminescence
    • D. Macdonald, J. Tan, and T. Trupke, "Imaging interstitial iron concentrations in boron-doped crystalline silicon unsing photoluminescence, " J. Appl. Phys., vol. 103, p. 073710, 2008.
    • (2008) J. Appl. Phys , vol.103 , pp. 073710
    • MacDonald, D.1    Tan, J.2    Trupke, T.3
  • 10
    • 84865197160 scopus 로고    scopus 로고
    • Imaging of metastable defects in silicon
    • M. C. Schubert, H. Habenicht, and W. Warta, "Imaging of metastable defects in silicon," J. Photovoltaics, vol. 1, pp. 168-173, 2011.
    • (2011) J. Photovoltaics , vol.1 , pp. 168-173
    • Schubert, M.C.1    Habenicht, H.2    Warta, W.3
  • 11
    • 0000066852 scopus 로고
    • Sensitivity and transient response of microwave reflection measurements
    • M. Scḧofthaler and R. Brendel, "Sensitivity and transient response of microwave reflection measurements," J. Appl. Phys., vol. 77, pp. 3162-3173, 1995.
    • (1995) J. Appl. Phys , vol.77 , pp. 3162-3173
    • Scḧofthaler, M.1    Brendel, R.2
  • 15
    • 77956366081 scopus 로고    scopus 로고
    • Minority carrier lifetime in silicon wafers from quasi-steady-state photoluminescence
    • J. Giesecke, M. C. Schubert, D. Walter, and W. Warta, "Minority carrier lifetime in silicon wafers from quasi-steady-state photoluminescence, " Appl. Phys. Lett., vol. 97, p. 092109, 2010.
    • (2010) Appl. Phys. Lett , vol.97 , pp. 092109
    • Giesecke, J.1    Schubert, M.C.2    Walter, D.3    Warta, W.4
  • 16
  • 17
    • 79953660454 scopus 로고    scopus 로고
    • Understanding the distribution of iron in multicrystalline silicon after emitter formation: Theoretical model and experiments
    • J. Scḧon, H. Habenicht, M. C. Schubert, and W. Warta, "Understanding the distribution of iron in multicrystalline silicon after emitter formation: theoretical model and experiments," J. Appl. Phys., vol. 109, pp. 1-8, 2011.
    • (2011) J. Appl. Phys , vol.109 , pp. 1-8
    • Scḧon, J.1    Habenicht, H.2    Schubert, M.C.3    Warta, W.4
  • 18
    • 84871755576 scopus 로고    scopus 로고
    • Analyses of the evolution of iron-silicide precipitates in multicrystalline silicon during solar cell processing
    • J. Scḧon, A. Haarahiltunen, H. Savin, D. P. Fenning, T. Buonassisi, W. Warta, and M. C. Schubert, "Analyses of the evolution of iron-silicide precipitates in multicrystalline silicon during solar cell processing," J. Photovoltaics, vol. 3, pp. 131-137, 2013.
    • (2013) J. Photovoltaics , vol.3 , pp. 131-137
    • Scḧon, J.1    Haarahiltunen, A.2    Savin, H.3    Fenning, D.P.4    Buonassisi, T.5    Warta, W.6    Schubert, M.C.7
  • 19
    • 84875594625 scopus 로고    scopus 로고
    • The impact of different diffusion temperature profiles on iron concentrations and carrier lifetimes in multicrystalline silicon wafers
    • B. Michl, J. Scḧon,W.Warta, andM. C. Schubert, "The impact of different diffusion temperature profiles on iron concentrations and carrier lifetimes in multicrystalline silicon wafers," J. Photovoltaics, vol. 3, pp. 635-640, 2012.
    • (2012) J. Photovoltaics , vol.3 , pp. 635-640
    • Michl, B.1    Scḧon, J.2    Warta, W.3    Schubert, M.C.4
  • 24
    • 0014580654 scopus 로고
    • Diffusion of nickel in amorphous silicon dioxide and silicon nitride films
    • R. N. Ghoshtagore, "Diffusion of nickel in amorphous silicon dioxide and silicon nitride films," J. Appl. Phys., vol. 40, p. 4374, 1969.
    • (1969) J. Appl. Phys , vol.40 , pp. 4374
    • Ghoshtagore, R.N.1
  • 26
    • 18744413698 scopus 로고    scopus 로고
    • Gettering in silicon-on-insulator wafers: Experimental studies and modelling
    • A. A. Istratov, H. V̈ain̈ola, W. Huber, and E. R. Weber, "Gettering in silicon-on-insulator wafers: experimental studies and modelling," Semicond. Sci. Technol., vol. 20, pp. 568-575, 2005.
    • (2005) Semicond. Sci. Technol , vol.20 , pp. 568-575
    • Istratov, A.A.1    V̈ain̈ola, H.2    Huber, W.3    Weber, E.R.4
  • 27
    • 84928128037 scopus 로고    scopus 로고
    • Silicon dioxide and silicon nitride as diffusion barrier for transition metals in solar cell applications
    • Glasgow, U.K
    • J. Isenberg, S. Reber, S. Aschaber, and W. Warta, "Silicon dioxide and silicon nitride as diffusion barrier for transition metals in solar cell applications," in Proc. 16th EU-PVSEC, Glasgow, U.K., 2000.
    • (2000) Proc. 16th EU-PVSEC
    • Isenberg, J.1    Reber, S.2    Aschaber, S.3    Warta, W.4
  • 28
    • 84884675747 scopus 로고    scopus 로고
    • Electrical confinement for the crystalline silicon thin-film solar cell on foreign substrate
    • Dr. rer. nat., Univ. Mainz, Mainz, Germany
    • S. Reber, "Electrical confinement for the crystalline silicon thin-film solar cell on foreign substrate," in Fachbereich Physik, Vol. Dr. rer. nat., Univ. Mainz, Mainz, Germany, 2000, p. 158.
    • (2000) Fachbereich Physik , pp. 158
    • Reber, S.1
  • 29
    • 0033343703 scopus 로고    scopus 로고
    • Diffusion of iron in silicon dioxide
    • D. A. Ramappa and W. B. Henley, "Diffusion of iron in silicon dioxide," J. Electrochemical Soc., vol. 146, p. 3773, 1999.
    • (1999) J. Electrochemical Soc , vol.146 , pp. 3773
    • Ramappa, D.A.1    Henley, W.B.2
  • 30
    • 84884674255 scopus 로고    scopus 로고
    • Rel. G-2012.06. [Online] Available
    • (2012). Synopsis, Synopsis TCAD, Rel. G-2012.06. [Online]. Available: http:/www.synopsis.com
    • (2012) Synopsis Synopsis TCAD
  • 32
  • 34
    • 75849147570 scopus 로고    scopus 로고
    • Simulation of iron distribution after crystallization of mc silicon
    • J. Scḧon, H. Habenicht, M. C. Schubert, andW.Warta, "Simulation of iron distribution after crystallization of mc silicon," Solid State Phenomena, vol. 156-158, pp. 223-228, 2010.
    • (2010) Solid State Phenomena , vol.156-158 , pp. 223-228
    • Scḧon, J.1    Habenicht, H.2    Schubert, M.C.3    Warta, W.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.