Diffusion of iron in silicon dioxide

Journal of the Electrochemical Society

Volumn 146, Issue 10, 1999, Pages 3773-3777

  Ramappa, Deepak A ^a   Henley, Worth B ^a  

^a UNIVERSITY OF SOUTH FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; DEEP LEVEL TRANSIENT SPECTROSCOPY; DIFFUSION IN SOLIDS; HIGH TEMPERATURE EFFECTS; IRON; MATHEMATICAL MODELS; SILICON WAFERS; THERMOOXIDATION;

SURFACE PHOTOVOLTAGE TECHNIQUE; TOTAL REFLECTION X-RAY FLUORESCENCE;

SILICA;

EID: 0033343703     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392548     Document Type: Article

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