Frequency dependent electrical characteristics of BiFeO3 MOS capacitors

Journal of Alloys and Compounds

Volumn 583, Issue , 2014, Pages 476-480

  Kaya, Senol ^a,b   Lok, Ramazan ^a,b   Aktag, Aliekber ^a,b   Seidel, Jan ^c   Yilmaz, Ercan ^a,b,d  

^a ABANT IZZET BAYSAL UNIVERSITY   (Turkey)

^b Nuclear Radiation Detectors Research and Development Center   (Turkey)

^c UNIVERSITY OF NEW SOUTH WALES   (Australia)

^d UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

BiFeO3; Conductance; Interface states; MOS capacitor; Series resistance; XRD

Indexed keywords

BIFEO3; CONDUCTANCE MEASUREMENT; ELECTRICAL CHARACTERISTIC; LOW AND HIGH FREQUENCIES; LOW FREQUENCY REGIONS; RF-MAGNETRON SPUTTERING; SERIES RESISTANCES; XRD;

DIELECTRIC DEVICES; ELECTRIC CONDUCTANCE; ELECTRIC RESISTANCE; INTERFACE STATES; MAGNETRON SPUTTERING;

MOS CAPACITORS;

EID: 84884617374     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2013.08.204     Document Type: Article

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