Effect of oxygen partial pressure on the properties of NiO-Ag composite films grown by DC reactive magnetron sputtering

Journal of Alloys and Compounds

Volumn 583, Issue , 2014, Pages 396-403

  Ashok Kumar Reddy, Y ^a   Sivasankar Reddy, A ^b   Sreedhara Reddy, P ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b Kongju National University   (South Korea)

Author keywords

Electrical resistivity; Grain size; NiO Ag composite film; Oxygen partial pressure; Sputtering

Indexed keywords

COMPOSITE THIN FILMS; DC REACTIVE MAGNETRON SPUTTERING; GRAIN SIZE; HALL MEASUREMENTS; MORPHOLOGICAL STUDY; NIO-AG COMPOSITE FILMS; OXYGEN PARTIAL PRESSURE; ROOT MEAN SQUARE ROUGHNESS;

ATOMIC FORCE MICROSCOPY; COMPOSITE FILMS; ELECTRIC CONDUCTIVITY; ELECTRON SPECTROSCOPY; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; PARTIAL PRESSURE; PHOTOELECTRONS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

POSITIVE IONS;

EID: 84884472751     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2013.08.180     Document Type: Article

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