|
|
Volumn 42, Issue 13, 2009, Pages
|
|
Physical properties of silver oxide thin films by pulsed laser deposition: Effect of oxygen pressure during growth
a
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
EFFECT OF OXYGEN;
FLUORESCENCE IMAGING;
GRAIN SIZE;
GROWTH CHAMBER;
NON-VOLATILE MEMORIES;
OXYGEN PRESSURE;
PLASMONIC DEVICES;
PLD TECHNIQUE;
POLYCRYSTALLINE;
POTENTIAL APPLICATIONS;
ROOM TEMPERATURE;
SILVER OXIDES;
SINGLE PHASE;
STRETCHING VIBRATIONS;
SURFACE WORK FUNCTIONS;
ULTRAHIGH DENSITY;
WAVE NUMBERS;
DEPOSITION;
FILM PREPARATION;
ORGANIC POLYMERS;
OXIDE FILMS;
OXIDES;
OXYGEN;
PHYSICAL PROPERTIES;
PLASMONS;
PRESSURE EFFECTS;
PROGRAMMABLE LOGIC CONTROLLERS;
PULSED LASER DEPOSITION;
RAMAN SPECTROSCOPY;
SILVER COMPOUNDS;
STRETCHING;
SURFACE ROUGHNESS;
THIN FILMS;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
SILVER;
|
|
EID: 70149109762
PISSN: 00223727
EISSN: 13616463
Source Type: Journal
DOI: 10.1088/0022-3727/42/13/135411 Document Type: Article |
|
Times cited : (94)
|
|
References (20)
|
