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Volumn 519, Issue 10, 2011, Pages 3021-3025
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Copper doped nickel oxide transparent p-type conductive thin films deposited by pulsed plasma deposition
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Author keywords
Copper doped nickel oxide; Electrical properties and measurements; p type transparent conducting oxide; Pulsed plasma deposition; Surface morphology; Thin film diode; X ray diffraction
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Indexed keywords
ELECTRICAL AND OPTICAL PROPERTIES;
ELECTRICAL PROPERTIES AND MEASUREMENTS;
JUNCTION DIODE;
OXYGEN PRESSURE;
P-TYPE;
P-TYPE TRANSPARENT CONDUCTING OXIDE;
PULSED PLASMA DEPOSITION;
ROOM TEMPERATURE;
SUBSTRATE TEMPERATURE;
THIN FILM DIODE;
VISIBLE REGION;
CONDUCTIVE FILMS;
COPPER;
CURRENT VOLTAGE CHARACTERISTICS;
DEPOSITION;
DIFFRACTION;
DIODES;
DISTILLATION;
ELECTRIC PROPERTIES;
ELECTRIC VARIABLES MEASUREMENT;
MORPHOLOGY;
NICKEL;
NICKEL OXIDE;
OPTICAL PROPERTIES;
ORGANIC LIGHT EMITTING DIODES (OLED);
OXIDE FILMS;
OXYGEN;
PLASMAS;
SURFACE MORPHOLOGY;
THIN FILMS;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
PLASMA DEPOSITION;
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EID: 79952311542
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2010.12.009 Document Type: Article |
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Times cited : (45)
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References (30)
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