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Physica Scripta

Volumn 87, Issue 1, 2013, Pages

Influence of oxygen partial pressure on the structural, optical and electrical properties of Cu-doped NiO thin films

(3) Ashok Kumar Reddy, Y a Sivasankar Reddy, A b Sreedhara Reddy, P a

a SRI VENKATESWARA UNIVERSITY (India)

b Kongju National University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE THIN FILMS; COMPOSITIONAL ANALYSIS; CU CONTENT; CU-DOPED; CUBIC STRUCTURE; DC REACTIVE MAGNETRON SPUTTERING; DEPOSITED FILMS; GLASS SUBSTRATES; INFLUENCE OF OXYGEN; MORPHOLOGICAL STUDY; NI CONTENT; NIO THIN FILM; OPTICAL AND ELECTRICAL PROPERTIES; OXYGEN PARTIAL PRESSURE; OXYGEN PRESSURE; POLYCRYSTALLINE; PREFERENTIAL GROWTH; RESISTIVITY VALUES;

DEPOSITS; ELECTRIC PROPERTIES; POSITIVE IONS; SUBSTRATES; THIN FILMS;

PARTIAL PRESSURE;

EID: 84872073077 PISSN: 00318949 EISSN: 14024896 Source Type: Journal
DOI: 10.1088/0031-8949/87/01/015801 Document Type: Article

Times cited : (11)

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