The influences of preparation parameters on NiO thin film properties for gas-sensing application

Sensors and Actuators, B: Chemical

Volumn 78, Issue 1-3, 2001, Pages 126-132

  Hotovy, I ^a   Huran, J ^b   Siciliano, P ^c   Capone, S ^d   Spiess, L ^e   Rehacek, V ^a  

^a SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^b INSTITUTE OF ELECTRICAL ENGINEERING   (Slovakia)

^c CNR   (Italy)

^d INFM   (Italy)

^e ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Carbon monoxide; Gas sensors; Nickel oxide; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON MONOXIDE; ENERGY DISPERSIVE SPECTROSCOPY; FILM PREPARATION; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MORPHOLOGY; NICKEL COMPOUNDS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

DIRECT CURRENT REACTIVE MAGNETRON SPUTTERING;

CHEMICAL SENSORS;

EID: 0035975062     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(01)00802-4     Document Type: Article

References (7)

1. 2 atmosphere
2. Nickel oxide electrochromic thin films prepared by reactive dc magnetron sputtering
3. Ozone-enhanced molecular beam deposition of nickel oxide for sensor applications
4. 2 sensing
5. Deposition and properties of nickel oxide films produced by dc reactive magnetron sputtering
6. 3 thin films as sensitive elements for NO detection
7. A study of physical properties and gas-surface interaction of vanadium oxide thin films