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Volumn 5, Issue 19, 2013, Pages 8940-8944
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Origin of the self-limited electron densities at Al2O 3/SrTiO3 heterostructures grown by atomic layer deposition-oxygen diffusion model
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Author keywords
[No Author keywords available]
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Indexed keywords
2-DIMENSIONAL ELECTRON GAS;
ATOMIC LAYER;
CRITICAL THICKNESS;
DIFFUSION MODEL;
OXYGEN DIFFUSION;
ALUMINUM;
CARRIER CONCENTRATION;
DEPOSITION;
DIFFUSION IN GASES;
ELECTRON DENSITY MEASUREMENT;
ELECTRON GAS;
STRONTIUM TITANATES;
ATOMIC LAYER DEPOSITION;
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EID: 84884229776
PISSN: 20403364
EISSN: 20403372
Source Type: Journal
DOI: 10.1039/c3nr03082b Document Type: Article |
Times cited : (27)
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References (21)
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